Accurate Fin Patterning in Emerging Devices for 32nm and Beyond

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Accurate Fin Patterning in Emerging Devices for 32nm and Beyond
(7/9/2007) Future Fab Intl. Issue 23
By Koen Snoeckx, IMEC
Rita Rooyackers, IMEC
Malgorzata Jurczak, IMEC
Abhisek Dixit, Ph.D. student

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The objective of emerging-devices research is to study CMOS device architectures with better scaling properties for the (sub-)32nm nodes than conventional planar-bulk devices.

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