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Saturday, August 23, 2014

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Extending ArF Immersion Through Scanner Performance and Computational Lithography

Contributed by Nikon Precision

IC manufacturing technology continues to advance rapidly to meet next-generation requirements. Although integration of EUV lithography has been further delayed due to complex infrastructure issues, the past year has been marked with tremendous innovations in 193 nm scanner technology. Extension of ArF immersion lithography is imperative for chipmakers to maintain their roadmaps, with enhanced tool performance and flexible computational lithography solutions equally critical in extending 193 nm capabilities.

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July 2013 Issue:

Future Visions & Current Concerns

About every 10 years, the semiconductor industry reinvents itself in order to make progress. In this issue of Future Fab International, you will find two significant examples of this innovation process.

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New Technologies & Device Structures

As Future Fab wraps up a distinguished run of service to the international semiconductor community, I would like to take this opportunity to thank my colleagues for offering concise, timely and relevant technology updates and contributions through this publication. Like the phoenix, I trust that new publication opportunities will arise from these ashes that will be well positioned to catch and ride the next tidal waves of emerging technologies.

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Chip Architecture & Integration

For nearly 50 years, Moore’s Law has reliably predicted the doubling of transistors on an integrated circuit every two years. However, in recent years, whispers that “Moore’s Law is dead” abound, as keeping on the technology treadmill bumps up against the limits of physics, economic viability, and the very nature of the application space for semiconductors in a post-PC world.

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Lithography Landscape

In this edition of Future Fab, Yayi Wei and David Cho of GLOBALFOUNDRIES examine the conundrum facing lithographers seeking patterning solutions for the 10 nm node, as the technical and cost challenges of extending 1.35NA 193 nm immersion patterning become more daunting.

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Metrology, Inspection & Failure Analysis

Amid the continued advances of 3D interconnect technology, related improvements in the associated metrology have become ever-more critical.

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2002: The Year of Realized Hopes and Disappointments
The recovery is here. Demand is rising. Shipments are up. Blue sky and all roses? Yes, and no. Yes, we believe the industry has entered into recovery. Despite the choppiness on Wall Street, the recovery is, so far, on track. In the quarterly picture, we are seeing progressive improvements for sales in the electronics industry, albeit from last year’s depressed levels. So, there is reason for a small sigh of relief and maybe first smile, especially as momentum is building for a great 2003.
Future Fab Intl.Volume 13, 7/8/2002


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